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DIP-U1959-03-9421-A-B-5

产品描述Array/Network Resistor, Isolated, Thin Film, 0.04W, 9420ohm, 50V, 0.05% +/-Tol, -25,25ppm/Cel, 4025,
产品类别无源元件    电阻器   
文件大小999KB,共6页
制造商TT Electronics plc
官网地址http://www.ttelectronics.com/
标准
下载文档 详细参数 全文预览

DIP-U1959-03-9421-A-B-5概述

Array/Network Resistor, Isolated, Thin Film, 0.04W, 9420ohm, 50V, 0.05% +/-Tol, -25,25ppm/Cel, 4025,

DIP-U1959-03-9421-A-B-5规格参数

参数名称属性值
是否Rohs认证符合
Objectid793704840
Reach Compliance Codecompliant
Country Of OriginUSA
ECCN代码EAR99
YTEOL6.9
其他特性ULTRA PRECISION
构造Rectangular
元件功耗0.04 W
第一元件电阻9420 Ω
JESD-609代码e4
安装特点THROUGH HOLE MOUNT
网络类型Isolated
元件数量1
功能数量4
端子数量8
最高工作温度125 °C
最低工作温度-55 °C
封装高度2.032 mm
封装长度10.16 mm
封装形式DIP
封装宽度6.35 mm
包装方法MAGAZINE
额定功率耗散 (P)0.04 W
额定温度70 °C
电阻9420 Ω
电阻器类型ARRAY/NETWORK RESISTOR
第二/最后一个元素电阻9420 Ω
表面贴装NO
技术THIN FILM
温度系数25 ppm/°C
温度系数跟踪5 ppm/°C
端子面层Gold (Au)
端子形状FLAT
容差0.05%
工作电压50 V

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Resistors
Ultra Precision Networks
Ultra Precision Networks
Ultra-stable, high stability Tantalum Ultride
TM
film
Custom schematics and values available
Ideal for medical
Ultra-stable,
Series
instrumentation and process controls
Ultra Precision
high stability Tantalum Ultride
TM
film
Ideal
Superior biased moisture performance to Nichrome film
Ultra Precision Series
values available
and process controls
Custom
for medical
and
schematics
instrumentation
Ultra Precision Series
connections - Not susceptible to dendritic growth
No
Superior
internal solder
Ultra-stable,
biased moisture performance
lm
Nichrome film
high stability Tantalum Ultride
TM
to
Custom schematics and values available
Custom schematics and values available
No
for medical stability Tantalum Ultride
TM
fi controls
Ideal
internal solder connections - Not susceptible to dendritic growth
Ultra-stable, high instrumentation and process lm
Ultra Precision Networks
Ultra Precision Series
Ultra Precision Networks
Ultra Precision Series
Ultra Precision Networks
Custom schematics and values available
Electrical Data
Element Power
Electrical Data
@ 70°C (W)
Electrical Data
(%)
Absolute Tolerance
Resistance Range (W)
The IRC Ultra-Precision Series utilizes our new Tantalum Ultride technology
and delivery.
in Texas, you can be assured consistent performance, reliability
for superior long-term performance in harsh environments. Based on the
The IRC Ultra-Precision Series utilizes our new Tantalum Ultride technology
The IRC Ultra-Precision Series utilizes our new Tantalum Ultride technology
proven performance of our TaNFilm
®
technology, our Ultra-Precision Networks maintain their characteristics resulting
for superior long-term performance in harsh environments. Based on the
for superior long-term performance
®
in harsh environments. Based on the
in the highest reliability and performance. Completely manufactured in our state-of-the-art, ISO qualified facility located
proven performance of our TaNFilm technology, our Ultra-Precision Networks maintain their characteristics resulting
proven performance assured consistent performance, reliability and delivery.
in Texas, you can be of our TaNFilm
®
technology, our Ultra-Precision Networks maintain their characteristics resulting
in the highest reliability and performance. Completely manufactured in our state-of-the-art, ISO qualifi
SON-UN9xx
ed facility located
DIP-U19xx
SIP-U47xx
FP-U89xx
PFC-UD1206
in the highest reliability and performance. Completely manufactured in our state-of-the-art, ISO qualified facility located
in Texas, you can be assured consistent performance, reliability and delivery.
in Texas,
Resistance Range (W)
you can be assured consistent performance,
-
reliability and delivery.
1.00K 100K
1.00K - 100K
1.00K - 50K
1.00K - 50K
1.00K - 50K
Ultra-stable, high stability Tantalum Ultride
TM
film
Superior medical
Ultra-Precision
and process controls
new Tantalum Ultride technology
Ideal for biased moisture performance to Nichrome film
The IRC
instrumentation
Series utilizes our
Ideal for medical instrumentation and process controls
No internal solder connections - Not susceptible to dendritic
environments. Based on the
for superior long-term performance in
film
Superior biased moisture performance to Nichrome
harsh
growth
Superior biased moisture performance to Nichrome film
proven performance
-
our TaNFilm
®
technology, our
No internal solder connections
of
Not susceptible to dendritic growth
Ultra-Precision Networks maintain their characteristics resulting
No internal solder connections - Not susceptible to
All Pb-free parts comply with EU Directive 2011/65/EU amended by (EU) 2015/863 (RoHS3)
dendritic growth
in the highest reliability and performance. Completely manufactured in our state-of-the-art, ISO qualified facility located
Electrical Data
DIP-U19xx
1.00K - 100K
DIP-U19xx
DIP-U19xx
0.04
1.00K - 100K
1.00K - 100K
0.04
0.04
0.04
SIP-U47xx
1.00K - 100K
SIP-U47xx
SIP-U47xx
0.04
1.00K - 100K
1.00K - 100K
0.04
0.04
0.04
FP-U89xx
0.025
SON-UN9xx
0.025
PFC-UD1206
1.00K - 50K
PFC-UD1206
PFC-UD1206
0.025
1.00K - 50K
1.00K - 50K
0.025
0.025
0.025
Ratio Tolerance
Element Power @ 70°C (W)
Resistance Range (W)
(%)
Resistance Range (W)
Absolute
70°C
AbsolutePower @
TCR (ppm/°C)
Element Tolerance (%) (W)
Element Power @ 70°C (W)
Tracking TCR
Ratio Tolerance (%) (%)
Absolute Tolerance
(ppm/°C)
Absolute Tolerance (%)
Absolute TCR (ppm/°C)
Rated Voltage
Ratio Tolerance (%)
Ratio Tolerance (%)
Tracking TCR (ppm/°C)
cient (ppm/Volt)
Absolute TCR (ppm/°C)
Voltage Coeffi
Absolute TCR (ppm/°C)
Rated Voltage (ppm/°C)
Tracking TCR
Operating Temperature Range (°C)
Tracking TCR (ppm/°C)
Voltage
Film Technology
Coeffi
Rated Voltage cient (ppm/Volt)
Rated Voltage
Operating Temperature Range (°C)
Voltage
Substrate
(ppm/Volt)
Coefficient
Voltage Coefficient (ppm/Volt)
Film Technology
Operating Temperature Range (°C)
Operating Temperature Range (°C)
Substrate
Film Technology
Film Technology
Substrate
Substrate
Environmental Data
Test
±0.02
- 50K
1.00K - 50K
To
SON-UN9xx
1.00K
FP-U89xx
FP-U89xx
SON-UN9xx
0.025
0.025
1.00K - 50K
To ±0.01
- 50K
1.00K
1.00K - 50K
1.00K - 50K
To ±10
To ±0.02
0.025
0.025
0.025
0.025
To ±1
To ±0.01
±0.02
To ±0.02
To
PxR
±10
To ±0.01
not to exceed 50V
To ±0.01
To ±1
To ±10
<0.1
To ±10
50V
To ±1
PxR not to exceed
-55 to +125
To ±1
<0.1
Tantalum
PxR not to exceed 50V
Ultride
PxR not to exceed 50V
-55 <0.1
High Purity Alumina
to +125
<0.1
Tantalum +125
-55 to Ultride
-55 to +125
High PurityUltride
Tantalum Alumina
Tantalum Ultride
High Purity Alumina
High Purity Alumina
Environmental Data
Noise
MIL-STD - 202 Method 308
Test
Environmental
Shock
Absolute Thermal
Data
Environmental Data
MIL
-
Method
- 202
308
107, Cond B
Noise
MIL-STD
- STD
202 Method
Method
Test
Method
Ratio Thermal Shock
Test
Method
Absolute Thermal Shock
Noise
Absolute Humidity
MIL-STD -
MIL -
Method
202 Method 106,
202
STD -
308
MIL -MIL-STD - 202 Method 308
STD - 202 Method 107, Cond B
Noise
Ratio Thermal Shock
With Bias
Absolute Thermal Shock
Absolute
Ratio Humidity
Thermal Shock
MIL - STD - 202 Method 107, Cond B
Voltage Applied
Absolute Humidity
MIL MIL - STD - 202 Method 106, B
- STD - 202 Method 107, Cond
Ratio Thermal Shock
Ratio Thermal Shock
With Bias
Absolute Shelf Life
1 year, 25
Ratio Humidity
MIL - STD - 202 Method 106,
°C
Absolute Humidity
Voltage Applied
MIL - STDWith Bias
<65% RH
- 202 Method 106,
Absolute
Ratio Shelf Life
Humidity
Absolute Shelf Life
Ratio Humidity
1 With Bias
year, 25 °C
Voltage Applied
Ratio Humidity
Absolute Stability
Voltage Applied
<65% RH
Ratio Shelf LifeLife
70°C -
°C
Absolute Shelf
1 year, 25
1000 hours, rated power
Absolute
Ratio Stability
Shelf Life
1 <65%25 °C
year, RH
Absolute Stability
Ratio Shelf Life
<65% RH
70°C - 1000 hours, rated power
Ratio Shelf Life
Ratio Stability
Absolute Stability
Absolute Stability
70°C - 1000 hours, rated power
General Note
70°C - 1000 hours, rated power
IRC reserves
Ratio Stability
the right to make changes in product specification without notice or liability.
Ratio Stability
is subject to IRC’s own data and is considered accurate at time of going to print.
All information
Method
<-35 dB
ΔR
±0.01%
<-35 dB
ΔR
±0.01%
<-35 dB
<-35 dB
ΔR
±0.03%
ΔR
±0.01%
ΔR
±0.01%
ΔR
±0.02%
ΔR
±0.03%
ΔR
±0.03%
ΔR
±0.005%
ΔR
±0.02%
ΔR
±0.02%
ΔR
±0.005%
ΔR
±0.01%
ΔR
±0.005%
ΔR
±0.002%
ΔR
±0.01%
ΔR
±0.01%
ΔR
±0.02%
ΔR
±0.002%
ΔR
±0.002%
ΔR
±0.005%
ΔR
±0.02%
ΔR
±0.02%
ΔR
±0.005%
ΔR
±0.005%
ΔR
±0.03%
ΔR
±0.02%
ΔR
±0.005%
ΔR
±0.01%
ΔR
±0.002%
ΔR
±0.02%
ΔR
±0.005%
General Note
IRC reserves the right to make changes in product specification without notice or liability.
General
is subject
Advanced
and is
Division
• 4222 South Staples Street
© IRC
All information
Note
to IRC’s own data
Film
considered accurate at time of going to print.
• Corpus Christi Texas 78411 USA
General Note
Telephone: 361 992 7900 Facsimile: 361 992
product specification without notice or liability.
TT Electronics reserves the right to
make changes in
3377 • Website: www.irctt.com
General
the right
IRC reserves
Note
to make changes in product specification without notice or liability.
©
informationthe subject to IRC’s
Division
•is consideredStaples Street • Corpus Christi Texas 78411 USA
going to print.
IRC
information is subject
changes in product specification withoutat time of going to print.
All
reserves is right to
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TT Electronics’
South accurate notice or liability.
All
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Telephone: 361is subject to Facsimile: 361 992 3377 • Website: www.irctt.com of going to print.
All information 992 7900 • IRC’s own data and is considered accurate at time
Telephone: 361 992 7900 • Facsimile: 361 992 3377 • Website: www.irctt.com
BI Technologies IRC
Precision Series Issue May 2010 Sheet 1 of 6
A subsidiary of
Ultra
Welwyn
TT electronics plc
Ultra Precision Series Issue May 2010 subsidiary of
A Sheet 1 of 6
www.ttelectronics.com/resistors
TTA subsidiaryplc
electronics of
TT electronics plc
Ultra Precision Series Issue May 2010 Sheet 1 of 6
Ultra Precision Series Issue May 2010 Sheet 1 of 6
A subsidiary o
TT electronics plc
© IRC Advanced Film Division
• 4222 South Staples Street • Corpus Christi Texas 78411 USA
© TT
Advanced
plc
© IRC
Electronics
Film Division
3377 • Website: www.irctt.com Corpus Christi Texas 78411 USA
Telephone: 361 992 7900 • Facsimile: 361 992 • 4222 South Staples Street •
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