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HLX6228ABH

产品描述Standard SRAM, 128KX8, 32ns, CMOS, CDFP40, 0.775 X 0.710 INCH, CERAMIC, DFP-40
产品类别存储    存储   
文件大小975KB,共12页
制造商Honeywell
官网地址http://www.ssec.honeywell.com/
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HLX6228ABH概述

Standard SRAM, 128KX8, 32ns, CMOS, CDFP40, 0.775 X 0.710 INCH, CERAMIC, DFP-40

HLX6228ABH规格参数

参数名称属性值
厂商名称Honeywell
零件包装代码DFP
包装说明GDFP, FL40,.8,25
针数40
Reach Compliance Codeunknown
ECCN代码3A001.A.2.C
最长访问时间32 ns
I/O 类型COMMON
JESD-30 代码R-CDFP-F40
长度19.685 mm
内存密度1048576 bit
内存集成电路类型STANDARD SRAM
内存宽度8
功能数量1
端子数量40
字数131072 words
字数代码128000
工作模式ASYNCHRONOUS
最高工作温度125 °C
最低工作温度-55 °C
组织128KX8
输出特性3-STATE
封装主体材料CERAMIC, METAL-SEALED COFIRED
封装代码GDFP
封装等效代码FL40,.8,25
封装形状RECTANGULAR
封装形式FLATPACK, GUARD RING
并行/串行PARALLEL
电源3.3 V
认证状态Not Qualified
筛选级别MIL-STD-883 Class B
座面最大高度3.7084 mm
最大待机电流0.001 A
最小待机电流2.5 V
最大压摆率0.0039 mA
最大供电电压 (Vsup)3.6 V
最小供电电压 (Vsup)3 V
标称供电电压 (Vsup)3.3 V
表面贴装YES
技术CMOS
温度等级MILITARY
端子形式FLAT
端子节距0.635 mm
端子位置DUAL
总剂量1M Rad(Si) V
宽度18.034 mm

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HLX6228
HLX6228
128K x 8 STATIC RAM—Low Power SOI
The 128K x 8 Radiation Hardened Static RAM is a high
performance 131,072 word x 8-bit static random access
memory with industry-standard functionality. It is fabricated
with Honeywell’s radiation hardened technology, and is
designed for use in low voltage systems operating in radiation
environments. The RAM operates over the full military
temperature range and requires only a single 3.3 V ± 0.3V
power supply. The RAM is compatible with JEDEC standard
low voltage CMOS I/O. Power consumption is typically less
than 9 mW/MHz in operation, and less than 2 mW when
deselected. The RAM read operation is fully asynchronous,
with an associated typical access time of 32 ns at 3.3 V.
Honeywell’s
enhanced
SOI
RICMOS™IV
(Radiation
Insensitive CMOS) technology is radiation hardened through
the use of advanced and proprietary design, layout and process hardening techniques. The RICMOS™ IV low power
process is a SIMOX CMOS technology with a 150 Å gate oxide and a minimum drawn feature size of 0.7 µm (0.55 µm
effective gate length—Leff). Additional features include tungsten via plugs, Honeywell’s proprietary SHARP planarization
process and a lightly doped drain (LDD) structure for improved short channel reliability. A 7 transistor (7T) memory cell is
used for superior single event upset hardening, while three layer metal power bussing and the low collection volume
SIMOX substrate provide improved dose rate hardening.
FEATURES
RADIATION
Fabricated with RICMOS™ IV Silicon on Insulator
(SOI) 0.7 µm (L
eff
= 0.55 µm)
Total Dose Hardness through 1x10 rad(SiO
2
)
Neutron Hardness through 1x10
14
6
OTHER
Read/Write Cycle Times
o
32 ns (-55 to 125°C)
Typical Operating Power <9 mW/MHz
JEDEC Standard Low Voltage
CMOS Compatible I/O
Single 3.3 V
±
0.3 V Power Supply
Asynchronous Operation
Packaging Options
o
32-Lead Flat Pack (0.820 in. x 0.600 in.)
o
40-Lead Flat Pack (0.775 in. x 0.710 in.)
1
cm-
2
Dynamic and Static Transient Upset Hardness
9
through 1x10 rad(Si)/s
Dose Rate Survivability through <1x10 rad(Si)/s
Soft Error Rate of <1x10
Geosynchronous Orbit
No Latchup
-10
11
upsets/bit-day in
www.honeywell.com

 
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