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HLX6256-SH

产品描述32K x 8 STATIC RAM Low Power SOI
产品类别存储    存储   
文件大小151KB,共12页
制造商Honeywell
官网地址http://www.ssec.honeywell.com/
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HLX6256-SH概述

32K x 8 STATIC RAM Low Power SOI

HLX6256-SH规格参数

参数名称属性值
厂商名称Honeywell
零件包装代码DIE
包装说明DIE,
针数28
Reach Compliance Codeunknow
ECCN代码3A001.A.2.C
最长访问时间25 ns
JESD-30 代码R-XUUC-N28
内存密度262144 bi
内存集成电路类型STANDARD SRAM
内存宽度8
功能数量1
端口数量1
端子数量28
字数32768 words
字数代码32000
工作模式ASYNCHRONOUS
最高工作温度125 °C
最低工作温度-55 °C
组织32KX8
输出特性3-STATE
可输出YES
封装主体材料UNSPECIFIED
封装代码DIE
封装形状RECTANGULAR
封装形式UNCASED CHIP
并行/串行PARALLEL
认证状态Not Qualified
最小待机电流1.7 V
最大供电电压 (Vsup)3.6 V
最小供电电压 (Vsup)3 V
标称供电电压 (Vsup)3.3 V
表面贴装YES
技术CMOS
温度等级MILITARY
端子形式NO LEAD
端子位置UPPER

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Military & Space Products
32K x 8 STATIC RAM—Low Power SOI
FEATURES
RADIATION
• Fabricated with RICMOS
IV Silicon on Insulator (SOI)
0.55
µm
Low Power Process
• Total Dose Hardness through 1x10
6
rad(SiO
2
)
OTHER
• Read/Write Cycle Times
17 ns (Typical)
25 ns (-55 to 125°C)
HLX6256
• Typical Operating Power <10 mW/MHz
• Neutron Hardness through 1x10 cm
14
-2
• Asynchronous Operation
• Dynamic and Static Transient Upset Hardness
through 1x10
9
rad(Si)/s
• Dose Rate Survivability through 1x10
11
rad(Si)/s
• Single 3.3 V
±
0.3V Power Supply
• Soft Error Rate of <1x10
• Latchup Free
-10
• JEDEC Standard Low Voltage
CMOS Compatible I/O
upsets/bit-day
• Packaging Options
- 28-Lead Flat Pack (0.500 in. x 0.720 in.)
- 28-Lead DIP, MIL-STD-1835, CDIP2-T28
- 36-Lead Flat Pack (0.630 in. x 0.650 in.)
- Various Multi-Chip Module (MCM) Configurations
GENERAL DESCRIPTION
The 32K x 8 Radiation Hardened Static RAM is a high
performance 32,768 word x 8-bit static random access
memory with industry-standard functionality. It is fabri-
cated with Honeywell’s radiation hardened technology,
and is designed for use in low voltage systems operating in
radiation environments. The RAM operates over the full
military temperature range and requires only a single 3.3 V
±
0.3V power supply. The RAM is compatible with JEDEC
standard low voltage CMOS I/O. Power consumption is
typically less than 10 mW/MHz in operation, and less than
2 mW when de-selected. The RAM read operation is fully
asynchronous, with an associated typical access time of 14
ns at 3.3 V.
Honeywell’s enhanced SOI RICMOS
IV (Radiation Insen-
sitive CMOS) technology is radiation hardened through the
use of advanced and proprietary design, layout and pro-
cess hardening techniques. The RICMOS
IV low power
process is a SIMOX CMOS technology with a 150 Å gate
oxide and a minimum drawn feature size of 0.7
µm
(0.55
µm
effective gate length—L
eff
). Additional features include
tungsten via plugs, Honeywell’s proprietary SHARP pla-
narization process and a lightly doped drain (LDD) struc-
ture for improved short channel reliability. A 7 transistor
(7T) memory cell is used for superior single event upset
hardening, while three layer metal power bussing and the
low collection volume SIMOX substrate provide improved
dose rate hardening.

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