电子工程世界电子工程世界电子工程世界

关键词

搜索

型号

搜索

HLX6228TSF

产品描述128K x 8 STATIC RAM?Low Power SOI
文件大小153KB,共12页
制造商ETC
下载文档 全文预览

HLX6228TSF概述

128K x 8 STATIC RAM?Low Power SOI

文档预览

下载PDF文档
Military & Space Products
HLX6228
128K x 8 STATIC RAM—Low Power SOI
FEATURES
RADIATION
• Fabricated with RICMOS
IV Silicon on Insulator
(SOI) 0.7
µm
Low Power Process (L
eff
= 0.55
µm)
• Total Dose Hardness through 1x10
6
rad(Si)
• Neutron Hardness through 1x10
14
cm
-2
• Dynamic and Static Transient Upset Hardness
through 1x10
9
rad(Si)/s
• Dose Rate Survivability through 1x10
11
rad(Si)/s
• Soft Error Rate of <1x10
-10
Upsets/bit-day in Geosyn-
chronous Orbit
• No Latchup
OTHER
• Read/Write Cycle Times
32 ns (-55 to 125°C)
• Typical Operating Power <9 mW/MHz
• JEDEC Standard Low Voltage
CMOS Compatible I/O
• Single 3.3 V
±
0.3 V Power Supply
• Asynchronous Operation
• Packaging Options
– 32-Lead CFP (0.820 in. x 0.600 in.)
– 40-Lead CFP (0.775 in. x 0.710 in.)
GENERAL DESCRIPTION
The 128K x 8 Radiation Hardened Static RAM is a high
performance 131,072 word x 8-bit static random access
memory with industry-standard functionality. It is fabricated
with Honeywell’s radiation hardened technology, and is
designed for use in low voltage systems operating in radiation
environments. The RAM operates over the full military
temperature range and requires only a single 3.3 V
±
0.3V
power supply. The RAM is compatible with JEDEC standard
low voltage CMOS I/O. Power consumption is typically less
than 9 mW/MHz in operation, and less than 2 mW when de-
selected. The RAM read operation is fully asynchronous, with
an associated typical access time of 32 ns at 3.3 V.
Honeywell’s enhanced SOI RICMOS™ IV (Radiation Insensi-
tive CMOS) technology is radiation hardened through the use
of advanced and proprietary design, layout and process
hardening techniques.The RICMOS™ IV low power process is
a SIMOX CMOS technology with a 150 Å gate oxide and a
minimum drawn feature size of 0.7
µm
(0.55
µm
effective gate
length—L
eff
). Additional features include tungsten via plugs,
Honeywell’s proprietary SHARP planarization process and a
lightly doped drain (LDD) structure for improved short channel
reliability. A 7 transistor (7T) memory cell is used for superior
single event upset hardening, while three layer metal power
bussing and the low collection volume SIMOX substrate
provide improved dose rate hardening.
Solid State Electronics Center • 12001 State Highway 55, Plymouth, MN 55441 • (800) 323-8295 • http://www.myspaceparts.com

 
EEWorld订阅号

 
EEWorld服务号

 
汽车开发圈

 
机器人开发圈

About Us 关于我们 客户服务 联系方式 器件索引 网站地图 最新更新 手机版

站点相关: 大学堂 TI培训 Datasheet 电子工程 索引文件: 1904  747  783  41  2219  39  16  1  45  53 

器件索引   0 1 2 3 4 5 6 7 8 9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

北京市海淀区中关村大街18号B座15层1530室 电话:(010)82350740 邮编:100190

电子工程世界版权所有 京B2-20211791 京ICP备10001474号-1 电信业务审批[2006]字第258号函 京公网安备 11010802033920号 Copyright © 2005-2026 EEWORLD.com.cn, Inc. All rights reserved